Facilities

INSTRUMENT APPLICATIONS

BRUKER D8 ADVANCE

X-RAY DIFFRACTOMETER

 

 

Powder Diffraction

Small Angle X-ray Scattering

Grazing Incidence X-ray Diffraction

X-ray Reflectometry

Texture

Stress-Strain

 Samples: Powder, thin film, fiber, bulk

BRUKER TIGER S8

X-RAY FLUORESCENCE SPECTROMETER

 

 

 Wavelength Dispersive X-ray Fluorescence Spectrometer

Trace elemental Analysis from Boron to Uranium

 Ability to operate with solid, liquid, powder samples
Opportunity to prepare fused beads and pressed pellets in the sample preparation room (40 tons press, mill, Fluxana fusion system)

BRUKER D8 DISCOVER X-RAY DIFFRACTION SYSTEM

Texture identification, residual stress analysis 

THERMO K-ALPHA

X-RAY PHOTOELECTRON SPECTROMETER

 

 

X-ray Photoelectron Spectroscopy (XPS) is an analytical technique that detects the characteristic electrons ejected from the surface of a sample. Elements from Li to U can be detected. The technique is highly surface sensitive – the typical detection depth is ~5 nm – and can detect light elements such as Si (Z =14) and below at about 1% of the total surface composition and heavier elements down to ~0.1 % with an accuracy of 20 – 50 percent of the given value.
 

 Dry samples of solid, powders and thin films

ZEISS ULTRA PLUS

FIELD EMISSION SCANNING ELECTRON MICROSCOPE

 

 

High Resolution Imaging for dry samples. Opportunity to work with insulating samples without coating.

EDS Elemental Analysis available

 Dry solid, powder materials

ZEISS EVO LS15

SCANNING ELECTRON MICROSCOPE

 Surface morphology, opportunity to work with dry and wet samples under higher pressure (3000 Pa) without coating

EDS Elemental Analysis available

NANOMAGNETICS

ATOMIC FORCE MICROSCOPE

 

 

 Surface Topography, surface roughness
Magnetic Topography Best for surfaces and thin films

Bruker Dimension Icon AFM

Measurement in air and water, all modes, temperature control, modulus measurement

Agilent G200 Nano Indenter

Nanoindentation  system,  continuous
stiffness measurement,  surface scan  and express test applications

NANOVAK

PHYSICAL VAPOR DEPOSITION

 

 

High Vacuum Thermal Evaporator
RF and DC plasma sputter coatingCoating of electrically conductive or dielectric materials

Nanovak NVBJ-300TH

Thermal vapor deposition for high vapor pressure metals

Europlasma Junior Microwave Plasma

2.45 GHz plasma system, argon, oxygen, nitrogen and mixtures

RENISHAW INVIA - RAMAN MICROSCOPE

Surface mapping and depth profile analysis with the Raman signal.
Equipped with 785nm, 633nm, 532nm excitation laser sources.
Temperature control between -196 °C and +200 °C.
 

Measurements with solid, liquid, powder, thin film samples  

SHIMADZU UV-3600 - UV-VIS-NIR SPECTROPHOTOMETER

 

 

Absorption, % Transmission, Diffused and specular Reflection, Thickness measurements (185- 3300 nm wavelength)

 

Temperature control is available for liquid samples
 

Solid, liquid, powder, thin film analysis  

Thermo Scientific iS10 FT-IR

 

650-4000 cm-1, single reflection diamond ATR

Thermo Scientific iS50 FT-IR

 

50-12000 cm-1, step-scan, PM-IRRAS/FT-VCD Module, FT-Raman module,
single and multiple reflection ATR

Bruker Contour GT-K0 3B  White Light Profilometer

0.1 nm - 10 mm contactless surface topography

Agilent 7700x ICP-MS

 

Sensitive elemental analysis,
collision and reaction cell

 

Teledyne CETAC LSX-213 G2+ Laser Ablation

HelEx sampling cell for ICP-MS

Thermo Scientific Flash 2000

 

Organic CHNS/O elemental analysis

Twin Screw Extruder


 

Polymer and composite sample preparation

BRUKER D2 PHASER -
X-RAY DIFFRACTOMETER

 

 

Analysis of the crystal structure  

 For samples of powder and thin films

MALVERN ZS – ZETASIZER

 

 

 

Ability to measure hydrodynamic particle size and distribution between 0.3nm-10μm

T-control, pH control while measuring

 For liquid dispersions or emulsions

MALVERN KINEXUS - RHEOMETER


 

Viscosity measurements between 0.05 μNm-200mNm torque in a T-controlled environmentSolutions, pastes

KSV NIMA – LANGMUIR AND LANGMUIR BLODGETT DEPOSITION TROUGHS

 

Single Layer film preparation system
Coating, surface modification
 

KSV NIMA - MULTI VESSEL DIP COATER

Multi-layer coating with a pre-defined program

For coating and surface modification
 

Micromeritics ASAP 2020 HD
Accelerated Surface Area
and Porosimetry analyzer

 

BET  surface area analysis

Micromeritics Autopore IV Mercury Porosimeter

 

60,000 psi mercury porosimeter
Olympus IX-81 inverted fluorescence microscope High resolution epifluorescence imaging
Oxford Reactive Ion Etching  (RIE) Silicon and dielectric etching
Mori Seiki NMV5000 DCG 5-Axis CNC